Modifying Sequencer Capture to Utilize 2 Post Process Materials
I don't have a ton of experience in c++, so I'm not sure if I'm doing this correctly, but I've modified the
files to include a second PostProcessMaterial.
I inserted this
into the CompositionGraphCaptureProtocol header but I'm not seeing the change in editor after I build in vs or compile in editor. I'm trying to be able to render multiple passes using custom Post Process Materials at the same time.
What am I doing wrong?
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